HoloDark for DigitalMicrograph
HoloDark generates quantitative deformation and strain maps over wide fields
of view from a pair of dark-field electron holograms
References and Technical Notes
HoloDark is based on the patented technique and routines developed by
* M. Hytch, C. Gatel, F. Houdellier, E. Snoeck and K. Ishizuka, Darkfield electron holography for
strain mapping at the nanoscale, Microscopy and Analysis 23, November 2012 (PDF)
M.J. Hytch, F. Houdellier, F. Hue, and E. Snoeck, Ultramicroscopy 111 (2011) 1328-1337.
Dark-field electron holography for the measurement of geometric phase
M.J. Hytch, F. Houdellier, F. Hue, and E. Snoeck, Nature 453 (2008) 1086-1089.
Nanoscale holographic interferometry for strain measurements in electronic devices
F. Hue, M.J. Hytch, F. Houdellier, H. Bender, and A. Claverie, Appl. Phys. Lett. 95, 073103 (2009).
Strain mapping of tensiley strained silicon transistors with embedded Si1-yCy source and drain by dark-field holography.
M.J. Hytch, F. Houdellier, F. Hue, and E. Snoeck,
International Patent Application No PCT/FR2008/001302
F. Hue et al. J. Electron Microscopy 54 (2005) 181-190.
Calibration of projector lens distortions
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